Liquid crystal display device and method of fabricating the same

ABSTRACT

A liquid crystal display device includes an array substrate having reflective and transmissive regions in a pixel region, wherein the array substrate includes a reflective electrode corresponding to the reflective region and a pixel electrode on a first substrate. A color filter substrate defines the reflective region and the transmissive region in the pixel region. The color filter substrate includes a color filter with first and second portions that correspond to the respective transmissive and reflective regions on a second substrate. The thickness of the second portion is less than a thickness of the first portion. The combined thickness of the scatter and the thickness of the second portion is greater than the thickness of the first portion; and a liquid crystal layer between the array and color filter substrates.

The present patent document is a divisional of U.S. patent applicationSer. No. 11/643,499, filed Dec. 20, 2006, which claims priority toKorean Patent Application No. 2005-0135941 filed in Korea on Dec. 30,2005, which is hereby incorporated by reference.

BACKGROUND

1. Field of the Invention

The present invention relates to a liquid crystal display device, andmore particularly, relates to a liquid crystal display device and amethod of fabricating the same.

2. Discussion of the Related Art

Many types of flat panel displays have been developed to serve assubstitutes for cathode-ray tubes (CRTs), such as liquid crystal display(LCD) devices, plasma display panels (PDPs), field emission displays,and electro-luminescence displays (ELDs). LCD devices have manyadvantages over CRTs, including higher resolution, thinner profile, morecompact size, and lower power usage during operation.

LCD devices generally include two substrates that are spaced apart andface each other and a liquid crystal layer interposed between the twosubstrates. The two substrates also include electrodes that face eachother such that a voltage applied between the electrodes induces anelectric field across the liquid crystal layer. Alignment of the liquidcrystal molecules in the liquid crystal layer changes in relation to theintensity of the induced electric field which alters the lighttransmissivity of the LCD device. Thus, the LCD device displays imagesby varying the intensity of the induced electric field within respectivepixel regions that are provided with the LCD device.

LCD devices may be categorized into transmissive type, reflective type,and transflective type. Transmissive type LCDs require a backlight andconsumes a relatively large amount of power during operation. Reflectivetype LCDs are operated with the aid of external light, and thebrightness of the display is proportional to the amount of externallight available. Transflective type LCDs are selectively operated ineither transmissive or reflective modes. Transflective type LCD devicesimprove upon the disadvantages of the transmissive type and reflectivetype LCD devices.

Referring to FIG. 1, in an array substrate 1, a gate electrode 6, and agate line (not shown) are formed on a first substrate 2. A gateinsulating layer 10 is formed on the gate electrode 6. A semiconductorlayer that is formed from an active layer 13 and an ohmic contact layer16 is provided on the gate insulating layer 10 over the gate electrode6. Source and drain electrodes 23, 26 are formed on the ohmic contactlayer 16. Each of the gate electrode 6, the semiconductor layer, and thesource and drain electrodes 23, 26 combine to form a thin filmtransistor Tr. A data line 20 is provided on the gate insulating layer10. The data line 20 crosses the gate line to define a pixel region P. Afirst passivation layer 30 is formed on the data line 20 and the sourceand drain electrodes 23, 26. A reflective electrode 40 is formed on thefirst passivation layer 30 in a reflective region RA. A secondpassivation layer 45 is formed on the reflective electrode 40. A pixelelectrode 50 is formed on the second passivation layer 45 in the pixelregion P. The pixel electrode 50 contacts the drain electrode 26 througha drain contact hole 55.

In a color filter substrate 70, a black matrix 75 is formed on a secondsubstrate 71. Red (R), green (G) and blue (B) color filters 80 a, 80 b,and 80 c are formed in the corresponding pixel regions P. An overcoatlayer 85 is formed on the color filters 80 a, 80 b and 80 c. A commonelectrode 90 is formed on the overcoat layer 85.

A liquid crystal layer 60 is provided between the array substrate 1 andthe color filter substrate 70. When voltages are applied to both thepixel and common electrodes 50, 90, an electric field is induced withinthe liquid layer 60, and the liquid crystal molecules therein arereoriented in proportion to the electric field. Although not shown inthe drawings, an alignment layer is formed on each of the transparentand common electrodes 50, 90. Additionally, first and second retardationfilms 97, 95 may be formed on outer surfaces of the first and secondsubstrates 2 and 71.

As best shown in FIG. 1, a cell gap d₁ (i.e. the thickness of the liquidcrystal layer 60) of the reflective region RA is substantially the sameas a cell gap d₂ of the transmissive region TA. In a reflective mode, anexternal light passes through the liquid crystal layer 60, then reflectson the reflective electrode 40, and then passes through the liquidcrystal layer 60 again. Light in the reflective mode substantiallytravels as far through liquid crystal layer 60 as in the transmissivemode. Accordingly, there is a phase difference of light between thereflective and the transmissive modes.

To minimize or eliminate the phase difference, the transflective typeLCD device of FIG. 2 provided. In the transflective type LCD device, acell gap d₄ (i.e. the thickness of the liquid crystal layer 60) withinthe transmissive region TA is substantially twice the cell gap d₃ withinthe reflective region RA. Accordingly, the phase difference of FIG. 1 issubstantially prevented because light travels through the same thicknessof liquid crystal in both modes.

However, the transflective type LCD devices of FIGS. 1 and 2 have someproblems. Light in the reflective mode passes through the color filtertwice, and light in the transmissive mode passes through the colorfilter only once. Accordingly, color property differences between thereflective mode and the transmissive mode may occur. Also, thebrightness in the reflective mode may be less than in the transmissivemode. Further, the reflectivity is reduced because the reflectiveelectrode is flat.

Referring to FIG. 3, a through hole TH is formed in the color filters 80a, 80 b and 80 c in the reflective region RA. Light passing through thethrough hole TH in the reflective mode has substantially the sameproperties as light passing through the device in the transmissive mode,and brightness in the reflective mode is increased. Further, a firstpassivation layer 30 formed from two sub layers 30 a, 30 b has an unevensurface, which provides the reflective electrode 40 with a similaruneven surface. The uneven surface of the reflective electrode 40increases the overall reflectivity. However, at least two mask processesare required to form the uneven surface. The additional mast processincrease the fabrication time and product cost of an LCD device. Also,the processes of forming the uneven surface, makes it difficult to forma dual cell gap structure within the LCD panel.

BRIEF SUMMARY

A first representative embodiment of a liquid crystal display deviceincludes an array substrate formed with reflective and transmissiveregions in a pixel region, wherein the array substrate includes areflective electrode corresponding to the reflective region and a pixelelectrode on a first substrate. A color filter substrate with thereflective region and the transmissive region is provided in the pixelregion that includes a color filter with first and second portions thatcorrespond to the transmissive and reflective regions on a secondsubstrate, respectively. The thickness of the second portion is lessthan a thickness of the first portion. A scatter layer is provided onthe second portion. The combined thickness of the scatter layer and ofthe second portion is greater than the thickness of the first portion. Aliquid crystal layer is provided between the array and color filtersubstrates.

Another representative embodiment of a liquid crystal display deviceincludes an array substrate with reflective and transmissive regionsformed in a pixel region. The array substrate includes a reflectiveelectrode corresponding to the reflective region and a pixel electrodeformed on a first substrate and a color filter substrate with thereflective and transmissive regions formed in the pixel region. Thecolor filter substrate includes a color filter with a through hole inthe reflective region on a second substrate and a scatter layer thatincludes a first portion filling the through hole. The thickness of thefirst portion is greater than the color filter. A liquid crystal layeris provided between the array and color filter substrates.

Another representative embodiment provides a method of fabricating aliquid crystal display device. The method includes the steps offabricating an array substrate with reflective and transmissive regionsin a pixel region and fabricating the array substrate to include areflective electrode corresponding to the reflective region and a pixelelectrode on a first substrate. A color filter substrate is providedwith the reflective and transmissive regions in the pixel region. Themethod of forming the color filter includes the steps of forming thecolor filter substrate with first and second portions that correspond tothe transmissive and reflective regions on a second substrate,respectively and interposing a liquid crystal layer between the arrayand color filter substrates, and forming a scatter layer on the secondportion. The thickness of the second portion is less than a thickness ofthe first portion and the combined thickness of the scatter portion andthe second portion is greater than the thickness of the first portion.

Another representative embodiment is a method of fabricating a liquidcrystal display device that includes the steps of fabricating an arraysubstrate having reflective and transmissive regions in a pixel region,including the steps of forming a reflective electrode corresponding tothe reflective region and a pixel electrode on a first substrate andfabricating a color filter substrate having the reflective region andthe transmissive region in the pixel region. The step of fabricating thecolor filter substrate includes the steps of forming a color filter witha through hole in the reflective region on a second substrate andforming a scatter layer with a first portion filling the through holeinterposing a liquid crystal layer between the array and color filtersubstrates. The thickness of the first portion is greater than athickness of the color filter.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention andtogether with the description serve to explain the principles of theinvention.

In the drawings:

FIGS. 1 to 3 are cross-sectional views illustrating examples oftransflective type LCD devices according to the related art.

FIG. 4 is a cross-sectional view illustrating a transflective type LCDdevice according to a first exemplary embodiment.

FIG. 5 is a cross-sectional view illustrating a transflective type LCDdevice according to a second exemplary embodiment.

FIG. 6 is a cross-sectional view illustrating a transflective type LCDdevice according to a third exemplary embodiment.

FIG. 7 is a cross-sectional view illustrating a transflective type LCDdevice according to a fourth exemplary embodiment.

FIGS. 8A to 8E are cross-sectional views illustrating a method offabricating the color filter substrate according to the embodiment ofFIG. 4.

DETAILED DESCRIPTION OF THE DRAWINGS AND THE PRESENTLY PREFERREDEMBODIMENTS

Reference will now be made in detail to the embodiments of the presentinvention, examples of which are illustrated in the accompanyingdrawings.

Referring to FIG. 4, a transflective type LCD device 101 is providedthat includes an array substrate, a color filter substrate and a liquidcrystal layer 190 provided therebetween. In the array substrate, a gateelectrode 115 and a gate line (not shown) are formed on a firstsubstrate 110. A gate insulating layer 120 is formed on the firstsubstrate 110 having the gate electrode 115. A semiconductor layer 125is formed on the gate insulating layer 120 over the gate electrode 115.The semiconductor layer 125 includes an active layer 125 a formed fromintrinsic amorphous silicon and an ohmic contact layer 125 b formed fromimpurity-doped amorphous silicon. Source and drain electrodes 133, 136are formed on the ohmic contact layer 125 b. A data line (not shown) isformed on the gate insulating layer 120, which is made of the samematerial as the source and drain electrodes 133, 136. The data linecrosses the gate line to define a pixel region P. The gate electrode115, the semiconductor layer 125 and the source and drain electrodes133, 136 form a thin film transistor Tr.

A first passivation layer 140 is formed on the first substrate 110having the source and drain electrodes 133, 136. The first passivationlayer 140 may be formed from an organic insulating material such asbenzocyclobutene (BCB) and acrylic resin. A top surface of the firstpassivation layer 140 is normally substantially flat. A reflectiveelectrode 146 is formed on the first passivation layer 140 in areflective region RA. The reflective electrode 146 has a transmissivehole corresponding to a transmissive region TA. A top surface of thereflective electrode 146 is substantially flat. The reflective electrode146 be formed from a highly reflective material such as aluminum (Al). Asecond passivation layer 149 is formed on the first substrate 110 havingthe reflective electrode 146.

A drain contact hole 145 is formed through the first passivation layer140, the reflective electrode 146, and the second passivation layer 149to expose the drain electrode 136. A pixel electrode 152 is formed onthe second passivation layer 140 in the pixel region P and contacts thedrain electrode 136 through the drain contact hole 145. The pixelelectrode 152 may also contact the reflective electrode 146 through thedrain contact hole 145. The pixel electrode 152 may be formed from atransparent conductive material such as indium-tin-oxide (ITO),indium-zinc-oxide (IZO), or indium-tin-zinc-oxide (ITZO). A height ofthe array substrate within the reflective region RA is substantially thesame as a height of the array substrate within the transmissive regionTA. A black matrix 175 is formed on a second substrate 170 in the colorfilter substrate. The black matrix 175 may correspond to the thin filmtransistor T, and the gate and data lines.

A color filter 178 is formed in the corresponding pixel region P. Thecolor filter 178 includes red (R), green (G) and blue (B) color filters.The color filter 178 has a first portion 178 a that corresponds to thetransmissive region TA and a second portion 178 b that corresponds tothe reflective region RA. The thickness t11 of the first portion 178 ais greater than the thickness t12 of the second portion 178 b. Forexample, the thickness t11 of the first portion 178 a is substantiallytwice the thickness t12 of the second portion 178 b. While light in areflective mode passes through the color filter 178 twice, and light ina transmissive mode passes through the color filter 178 once, becausethe first portion 178 a has twice the thickness of the second portion178 b, the color in the reflective mode can be substantially the same asthat in the transmissive mode.

A scatter layer 182 is provided on the second portion 178 b that may beformed from a transparent organic insulating material such as aphotoresist and a photo acrylic. The scatter layer 182 includes aplurality of beads 183 that scatters light. The beads 183 may bearranged within the scatter layer 182 so that the beads 183 can functionas an uneven pattern as shown in FIG. 3. The thickness t13 of thescatter layer 182 is such that a cell gap d11 (i.e. the thickness of theliquid crystal layer 190) of the transmissive region TA is substantiallytwice a cell gap d12 of the reflective region RA. In some embodiments,the thickness t13 of the scatter layer 182 may be one and half timesgreater the thickness t11 of the first portion 178 a. A common electrode185 is formed on the second substrate 170 from a transparent conductivematerial such as indium-tin-oxide (ITO), indium-zinc-oxide (IZO), orindium-tin-zinc-oxide (ITZO).

As described above, the reflective region of the color filter has asmaller thickness than the transmissive region. Accordingly, thetransflective type LCD device can have substantially the same colorproperties (brightness, shade, etc.) in the reflective mode and thetransmissive mode. Further, the scatter layer 182 has beads 183 and isformed on the color filter layer in the reflective region to provide thehigh reflectivity and the dual cell gap structure.

FIG. 5 is a cross-sectional view illustrating a transflective type LCDdevice according to a second exemplary embodiment of the presentinvention. The LCD device is similar to that of the first exemplaryembodiment except for the color filter and the scatter layer.Accordingly, explanations of parts similar to parts of the firstexemplary embodiment are not repeated here for the sake of brevity.

The color filter in a transmissive region TA has approximately the samethickness t21 as the color filter in a reflective region RA. A throughhole TH is formed in the color filter in the reflective region RA, whichallows color properties to be substantially the same in the reflectiveand transmissive modes. A scatter layer 282 fills the through hole THand is arranged with a thickness t22 such that the cell gap d21 (i.e.the thickness of the liquid crystal layer 290) in the transmissiveregion TA is substantially twice the cell gap d22 in the reflectiveregion RA that corresponds to the through hole TH. The thickness t22 ofthe scatter layer 282 may be twice the thickness t21 of the colorfilter, which accordingly achieves the dual cell gap structure.

FIG. 6 is a cross-sectional view illustrating a transflective type LCDdevice according to a third exemplary embodiment of the presentinvention. The LCD device of FIG. 6 is similar to that of the secondexemplary embodiment except for the structure of the scatter layer.Accordingly, an explanation of parts similar to parts of the secondexemplary embodiment is not repeated here for the sake of brevity.

Similar to the second exemplary embodiment, a color filter in atransmissive region TA substantially has the same thickness t31 as thecolor filter in a reflective region RA and a through hole TH is formedin the color filter in the reflective region RA. By forming the throughhole TH, the color properties may be substantially the same in thereflective and transmissive modes.

A scatter layer 382 includes first and second portions 382 a and 382 b.The first portion 382 a fills the through hole TH, as is similar to thescatter layer discussed with respect to the second exemplary embodiment.The second portion 382 b is formed on the color filter in the reflectiveregion RA. The second portion 382 b has a thickness t32 and the firstportion 382 a has a thickness (t31+t32) such that a cell gap d31 withinthe transmissive region TA is substantially twice a cell gap d32 withinthe reflective region RA. Further, the thickness t32 of the secondportion 382 b may the same as the thickness t31 of the color filter,which allows for the dual cell gap structure.

FIG. 7 is a cross-sectional view illustrating a transflective type LCDdevice according to a fourth exemplary embodiment of the presentinvention. The LCD device depicted in FIG. 7 is similar to that of thefirst exemplary embodiment except for the structure of the arraysubstrate and the common electrode. Accordingly, explanations of partssimilar to parts of the first exemplary embodiment are not repeated herefor the sake of brevity.

The LCD device of the first exemplary embodiment is operated with theelectric field that is induced vertically by the pixel electrode of thearray substrate and the common electrode of the color filter substrate.The LCD device 401 of the current exemplary embodiment is operated withan in-plane electric field that is induced horizontally by a pixelelectrode 452 and reflective and common electrodes 417 and 418 of anarray substrate.

Referring to FIG. 7, in the array substrate, the reflective electrode417 is formed on a first substrate 410 in a reflective region RA. Thereflective electrode 417 may be made of the same material as a gateelectrode 415. A common electrode 418 is formed on the first substrate410 corresponding to a transmissive hole of the reflective electrode417. The common electrode 418 contacts the reflective electrode 417. Thecommon electrode 418 may be formed from a transparent conductivematerial such as indium-tin-oxide (ITO), indium-zinc-oxide (IZO), orindium-tin-zinc-oxide (ITZO). A gate insulating layer 420 is on thefirst substrate 410 and has the gate electrode 415, the reflectiveelectrode 417, and the common electrode 418.

A passivation layer 440 is formed on the first substrate 410 having thesource and drain electrodes 433, 436. The passivation layer 440 has adrain contact hole 445 exposing the drain electrode 436. A plurality ofpixel electrodes 452 are formed on the passivation layer 440 in thepixel region P. The pixel electrodes 452 induce an in-plane electricfield with the location of the reflective and common electrodes 417, 418below the pixel electrode 452. The LCD device of the fourth exemplaryembodiment is referred to as a FFS (fringe field switching) mode LCDdevice. Alternately, an IPS (in-plane switching) mode LCD device may beprovided. In the IPS mode LCD device, a plurality of pixel electrodesand a plurality of common electrodes are alternately arranged to inducean in-plane electric field.

The structure to induce the in-plane electric field may be substitutedin the second and third exemplary embodiments discussed above.

FIGS. 8A to 8E are cross-sectional views of a method for fabricating thecolor filter substrate according to the first exemplary embodiment ofthe present invention shown in FIG. 4.

As shown in FIG. 8A, a black matrix 175 is formed on a substrate 170with a mask process. The black matrix 175 may be formed from chromium(Cr), chromium oxide (CrOx), or black resin.

As shown in FIG. 8B, a red (R) resist layer 177 is formed on thesubstrate 170 having the black matrix 175. A mask 196 is located overthe red (R) resist layer 177. The mask 196 has a transmitting portion T,a semi-transmitting portion HTA, and a blocking portion B. Thetransmitting portion T has a relatively high transmittance to allow fortransmission of light, the blocking portion B has a relatively lowtransmittance to block a significant amount of light, and thesemi-transmitting portion HTA has a light transmittance between thetransmitting portion T and the blocking portion B. The semi-transmittingportion HTA may have a multi-coating layer 197.

The blocking portion B corresponds to a transmissive region TA and thesemi-transmitting portion HTA corresponds to a reflective region RA. Thetransmitting portion T may be between the blocking portions B and thesemi-transmitting portions HTA.

A light exposure is performed for the red (R) resist layer 177. Forexample, the red (R) resist layer 177 may be a positive type. When thered (R) resist layer 177 is a negative type, positions of the blockingportion B and the transmitting portion T are altered. After the lightexposure, the red (R) resist layer 177 is developed.

Turning now to FIG. 8C, after exposing and developing the red (R) resistlayer 177, a red (R) color filter 178 is formed in a pixel region P. Afirst portion 178 a of the red (R) color filter 178 that corresponds tothe transmissive region TA has a thickness t11 and a second portion 178b of the red (R) color filter 178 that corresponds to the reflectiveregion RA has a thickness t12. The blue and green color filters may beformed in the same manner as discussed above.

The color filters of the second and third exemplary embodiments may beformed using a mask where the transmitting portions and the blockingportions are alternately arranged in the reflective region RA instead ofthe semi-transmitting portion HTA of FIG. 8B. In other words, thetransmitting portion corresponds to the through hole (TH of FIGS. 5 and6), and the blocking portion is between the transmitting portion in thereflective region RA.

Referring to FIG. 8D, an organic insulating material having a pluralityof beads is deposited on the substrate 170 having the red (R), green,and blue (B) color filters and is patterned with a mask process to forma scatter layer 182 in the reflective region RA. Accordingly, the colorfilter substrate that corresponds to the reflective region RA is thickerthan the color filter substrate that corresponds to the transmissiveregion TA. The cell gap of the transmissive region is substantiallytwice a cell gap of the reflective region due to the thicknessrelationship between the color filter and the scatter layer.

Referring to FIG. 8E, a common electrode 185 is formed on the substrate170 having the scatter layer 182. In the fourth exemplary embodiment,the common electrode is not formed in the color filter substrate, and anover coat layer may be formed on the substrate having the scatter layer.

Through the above processes, the color filter substrate according to thefirst exemplary embodiment of the present invention is fabricated. Thetransflective LCD device is fabricated by attaching the color filtersubstrate and the array substrate and interposing the liquid crystallayer between the two substrates.

As explained in the exemplary embodiments, the reflective region of thecolor filter has a smaller thickness than the transmissive region of thecolor filter, or the reflective region of the color filter is providedwith a through hole. Accordingly, the transflective type LCD device mayhave substantially the same color properties in both the reflective andtransmissive modes. Further, a scatter layer with beads may be formed inthe reflective region. Accordingly, the high reflectivity and the dualcell gap structure can be achieved with a relatively simple processesand at a low cost.

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the present inventionwithout departing from the spirit or scope of the invention. Thus, it isintended that the present invention cover the modifications andvariations of this invention provided they come within the scope of theappended claims and their equivalents.

1. A liquid crystal display device, comprising: an array substratehaving reflective and transmissive regions in a pixel region, whereinthe array substrate includes a reflective electrode corresponding to thereflective region, and a pixel electrode provided on a first substrate;a color filter substrate having the reflective region and thetransmissive region in the pixel region, the color filter substratecomprising: a color filter provided on a second substrate, the colorfilter comprising a through hole in the reflective region; and a scatterlayer including a first portion filling the through hole, wherein athickness of the first portion is greater than a thickness of the colorfilter; and a liquid crystal layer between the array and color filtersubstrates.
 2. The device according to claim 1, wherein the thickness ofthe color filter layer and the first portion are such that a cell gap ofthe liquid crystal layer corresponding to the transmissive region issubstantially twice a cell gap of the liquid crystal layer correspondingto the through hole.
 3. The device according to claim 2, wherein athickness of the array substrate corresponding to the transmissiveregion is substantially the same as a thickness of the array substratecorresponding to the reflective region.
 4. The device according to claim2, wherein the thickness of the first portion is substantially twice thethickness of the color filter.
 5. The device according to claim 1,wherein the scatter layer further includes a second portion on the colorfilter corresponding to the reflective region.
 6. The device accordingto claim 5, wherein the thickness of the color filter layer and thefirst and second portions are such that a cell gap of the liquid crystallayer corresponding to the transmissive region is substantially twice acell gap of the liquid crystal layer corresponding to the reflectiveregion.
 7. The device according to claim 6, wherein a thickness of thearray substrate corresponding to the transmissive region issubstantially the same as a thickness of the array substratecorresponding to the reflective region.
 8. The device according to claim6, wherein the thickness of the first portion is substantially twice thethickness of the color filter, and the thickness of the second portionis substantially the same as the thickness of the color filter.
 9. Thedevice according to claim 1, wherein the scatter layer includes aplurality of beads for scattering light.
 10. The device according toclaim 1, wherein the color filter substrate further comprises a commonelectrode provided on the scatter layer and the color filter layercorresponding to the transmissive region.
 11. The device according toclaim 1, wherein the array substrate further includes a common electrodeinducing an in-plane electric field with the pixel electrode.
 12. Thedevice according to claim 11, wherein the common electrode correspondsto a transmissive hole of the reflective electrode corresponding to thetransmissive region and is connected to the reflective electrode. 13.The device according to claim 11, wherein the pixel electrode and thecommon electrode are alternately arranged.
 14. The device according toclaim 1, wherein the pixel electrode corresponds to the pixel region.15. A method of fabricating a liquid crystal display device, comprisingthe steps of: fabricating an array substrate having reflective andtransmissive regions in a pixel region, wherein the step of fabricatingthe array substrate comprises the steps of forming a reflectiveelectrode corresponding to the reflective region and a pixel electrodeon a first substrate; fabricating a color filter substrate having thereflective region and the transmissive region in the pixel region, thestep of fabricating the color filter substrate comprises the steps of:forming a color filter having a through hole in the reflective region ona second substrate; and forming a scatter layer including a firstportion filling the through hole, wherein a thickness of the firstportion is greater than a thickness of the color filter; and interposinga liquid crystal layer between the array and color filter substrates.16. The method according to claim 15, wherein the step of forming thecolor filter comprises the step of: forming a color resist layer on thesecond substrate; and patterning the color resist layer using a maskhaving a blocking portion and a transmitting portion, wherein thetransmissive region corresponds to the blocking portion and thereflective region corresponds to the blocking portion and thetransmitting portion alternately arranged.
 17. The method according toclaim 15, wherein the thickness of the color filter layer and the firstportion are such that a cell gap of the liquid crystal layercorresponding to the transmissive region is substantially twice a cellgap of the liquid crystal layer corresponding to the through hole. 18.The method according to claim 17, wherein a height of the arraysubstrate corresponding to the transmissive region is substantially thesame as a height of the array substrate corresponding to the reflectiveregion.
 19. The method according to claim 17, wherein the thickness ofthe first portion is substantially twice the thickness of the colorfilter.
 20. The method according to claim 15, wherein the scatter layerfurther includes a second portion on the color filter corresponding tothe reflective region.
 21. The method according to claim 20, wherein thethickness of the color filter layer and the first and second portionsare such that a cell gap of the liquid crystal layer corresponding tothe transmissive region is substantially twice a cell gap of the liquidcrystal layer corresponding to the reflective region.
 22. The methodaccording to claim 21, wherein a height of the array substratecorresponding to the transmissive region is substantially the same as aheight of the array substrate corresponding to the reflective region.23. The method according to claim 21, wherein the thickness of the firstportion is substantially twice the thickness of the color filter, andthe thickness of the second portion is substantially the same as thethickness of the color filter.
 24. The method according to claim 15,wherein the scatter layer includes a plurality of beads for scatteringlight.
 25. The method according to claim 15, wherein the step offabricating the color filter substrate further comprises the step offorming a common electrode on the scatter layer and the color filterlayer corresponding to the transmissive region.
 26. The method accordingto claim 15, wherein the step of fabricating the array substrate furthercomprises the step of forming a common electrode inducing an in-planeelectric field with the pixel electrode.
 27. The method according toclaim 26, wherein the common electrode corresponds to a transmissivehole of the reflective electrode corresponding to the transmissiveregion and is connected to the reflective electrode.
 28. The methodaccording to claim 26, wherein the pixel electrode and the commonelectrode are alternately arranged.
 29. The method according to claim15, wherein the pixel electrode corresponds to the pixel region.